Malvern Panalytical – XRF – X’Pert³ Materials Research Diffractometers (MRD)
The new generation of versatile materials research diffraction systems
The long and successful history of PANalytical’s Materials Research Diffractometers (MRD) continues with a new generation – X’Pert³ MRD and X’Pert³ MRD XL.Both systems handle the same wide range of applications with full wafer mapping up to 100 mm (X’Pert³ MRD) or 200 mm (X’Pert³ MRD XL).
DKSH is the exclusive distributor in Cambodia, Laos, Malaysia, Myanmar, Philippines, Thailand and Vietnam.
The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in:
- advanced materials science
- scientific and industrial thin film technology
- metrological characterization in semiconductor process development
Technical Specifications
| Goniometer- Step Size | Minimum step size 0.0001˚ |
| Goniometer- Radius | Radius: X’Pert³ MRD 320 mm (horizontal); Radius: X’Pert³ MRD XL 420 mm (horizontal) |
|---|---|
| Open Eulerian Cradle- Chi Rotation | +/- 92˚ |
| Open Eulerian Cradle- Phi Rotation | 2 x 360˚ |
| Open Eulerian Cradle- x,y translation | 100 x 100 mm (X’Pert³ MRD); 200 x 200 mm (X’Pert³ MRD XL) |
| Open Eulerian Cradle- z translation | minimum step size 1 µm |
| C-to-C Wafer Loaders- Size | 2” to 150 mm; 100 to 300 mm |
Available Models
Technical Specifications
| Goniometer- Step Size | Minimum step size 0.0001˚ |
| Goniometer- Radius | Radius: X’Pert³ MRD 320 mm (horizontal); Radius: X’Pert³ MRD XL 420 mm (horizontal) |
|---|---|
| Open Eulerian Cradle- Chi Rotation | +/- 92˚ |
| Open Eulerian Cradle- Phi Rotation | 2 x 360˚ |
| Open Eulerian Cradle- x,y translation | 100 x 100 mm (X’Pert³ MRD); 200 x 200 mm (X’Pert³ MRD XL) |
| Open Eulerian Cradle- z translation | minimum step size 1 µm |
| C-to-C Wafer Loaders- Size | 2” to 150 mm; 100 to 300 mm |
The standard research and development version for use with thin film samples, wafers (complete mapping up to 100 mm) and solid materials. High-resolution analysis capability is improved by the outstanding accuracy of a new high-resolution goniometer using Heidenhain encoders.
Technical Specifications
| Goniometer- Step Size | Minimum step size 0.0001˚ |
| Goniometer- Radius | Radius: X’Pert³ MRD 320 mm (horizontal); Radius: X’Pert³ MRD XL 420 mm (horizontal) |
|---|---|
| Open Eulerian Cradle- Chi Rotation | +/- 92˚ |
| Open Eulerian Cradle- Phi Rotation | 2 x 360˚ |
| Open Eulerian Cradle- x,y translation | 100 x 100 mm (X’Pert³ MRD); 200 x 200 mm (X’Pert³ MRD XL) |
| Open Eulerian Cradle- z translation | minimum step size 1 µm |
| C-to-C Wafer Loaders- Size | 2” to 150 mm; 100 to 300 mm |
The X’Pert³ MRD XL meets all the high-resolution XRD analysis requirements of the semiconductors, thin films, and advanced materials industries. Complete wafer mapping up to 200 mm is possible. The X’Pert3 version comes with longest liftetime of incident beam components (CRISP) and maximum uptime with pneumatic shutters and beam attenuators. By facilitating analysis of wafers of up to 300 mm in diameter, with a sophisticated, automatic wafer loader option, the X’Pert³ MRD XL becomes an advanced tool for quality control of industrial thin layered structures.
Technical Specifications
| Enclosure- Dimensions | 1400 (w) x 1162 (d) x 1947 (h) mm |
| Enclosure- Weight | 1150 kg |
|---|---|
| Enclosure- Accessibility | Large doors, allowing access for up to four people simultaneously |
| Enclosure- Safety | Meets all relevant worldwide regulations for electrical, mechanical and X-ray safety, with all anode types |
| Enclosure- Set-up | System is on wheels for easy installation and relocation |
| Goniometer- Configuration | Vertical goniometer, available in theta-theta or alpha-1 geometry |
| Goniometer- Radius and Interface | 240 mm radius, interfaces are available to reduce the diffracted beam radius for specific applications |
| Goniometer- Usable Range | Maximum usable range (depending on accessories) -111°< 2θ <168° |
| Goniometer- Linearity | 2θ linearity equal or better than ±0.01° |
| Goniometer- Accuracy and Precision | New generation direct optical encoding system (DOPS 2) for lifetime goniometer accuracy, using precisely aligned Heidenhain encoders and path tracking technology |
| X-Ray Source- X-Ray Tube | Fully ceramic X-ray tubes manufactured by PANalytical’s specialized factory under cleanroom conditions |
| X-Ray Source- Generator | 4 kW generator supporting all current and future X-ray tubes |
| X-Ray Source- Performance | All Empyrean instruments are designed for 60 kV operation, allowing optimal performance for Mo and Ag sources |
The X’Pert³ Extended MRD (XL) brings increased versatility to the range of X’Pert³ MRD systems. An extra PreFIX mounting platform allows mounting of an X-ray mirror and a high-resolution monochromator in-line, increasing significantly the intensity of the incident beam. One can benefit from increased application versatility without compromise on data quality, high-resolution X-ray diffraction with high intensities, shorter measurement times for measurements such as reciprocal space mapping and rebuild from standard to extended configuration in minutes thanks to the PreFIX concept. With the 2nd generation PreFIX, reconfiguring is easy and optics positioning is more accurate than ever.
Technical Specifications
| Enclosure- DimI3:J22ensions | 1400 (w) x 1162 (d) x 1947 (h) mm |
| Enclosure- Weight | 1150 kg |
|---|---|
| Enclosure- Accessibility | Large doors, allowing access for up to four people simultaneously |
| Enclosure- Safety | Meets all relevant worldwide regulations for electrical, mechanical and X-ray safety, with all anode types |
| Enclosure- Set-up | System is on wheels for easy installation and relocation |
| Goniometer- Configuration | Vertical goniometer, available in theta-theta or alpha-1 geometry |
| Goniometer- Radius and Interface | 240 mm radius, interfaces are available to reduce the diffracted beam radius for specific applications |
| Goniometer- Usable Range | Maximum usable range (depending on accessories) -111°< 2θ <168° |
| Goniometer- Linearity | 2θ linearity equal or better than ±0.01° |
| Goniometer- Accuracy and Precision | New generation direct optical encoding system (DOPS 2) for lifetime goniometer accuracy, using precisely aligned Heidenhain encoders and path tracking technology |
| X-Ray Source- X-Ray Tube | Fully ceramic X-ray tubes manufactured by PANalytical’s specialized factory under cleanroom conditions |
| X-Ray Source- Generator | 4 kW generator supporting all current and future X-ray tubes |
| X-Ray Source- Performance | All Empyrean instruments are designed for 60 kV operation, allowing optimal performance for Mo and Ag sources |
With the X’Pert³ MRD (XL) system for in-plane diffraction, it becomes possible to measure diffraction from lattice planes that are perpendicular to the sample surface.
Standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films, are just two of many benefits.
Key Features
- Wafer mapping up to 200 mm meets all the high-resolution XRD analysis requirements.
- High-resolution analysis capability is improved by the outstanding accuracy of a new high-resolution goniometer using Heidenhain encoders.
- Provides the longest liftetime of incident beam components (CRISP) and maximum uptime with pneumatic shutters and beam attenuators.
- With the 2nd generation PreFIX mounting platform, reconfiguring is easy within minutes and optics positioning is more accurate than ever.
- Allows for the measurement of diffraction from lattice planes that are perpendicular to the sample surface.
- Possible standard and in-plane geometries on one system and a wide range of diffraction experiments on polycrystalline and highly perfect thin films.
Key Industries
- Die & Mould
- Electronics
- Powders & Pigments / Coating
- Semiconductor, Solar & Electronics
Brand
Malvern Panalytical was formed by the merger of Malvern Instruments Limited and PANalytical B.V. on 1st January 2017, has headquarters in both Almelo (the Netherlands), and in Malvern (UK), and employs over 2,000 people worldwide. The combined entity is a strong player and innovator in the materials characterization market and will leverage the strengths of the individual companies in their end markets, ranging from building materials to pharmaceuticals and from metals and mining to nanomaterials.